专利类型发明专利 |
申请类型暂无 |
申请方名称Chen Yu Liu , Ching Yu Chang , An Ren Zi |
发明人暂无 |
申请号US18321310 |
公开号US20230305396A1 |
国际申请暂无 |
申请日2023-05-22 00:00:00 |
主分类号G03F7/004 |
代理机构暂无 |
代理人暂无 |
公开日2023-09-28 00:00:00 |
优先权US62892666 |
进入国家日暂无 |
国际公布日暂无 |
国际申请日暂无 |
地址Hsin-Chu TW |
检索词暂无 |
1. A photoresist, comprising : a metal-containing component; and one or more ligands coupled to the metal-containing component; wherein each ligand in a subset of the one or more ligands includes : a first chemical coupled to the metal-containing component, wherein the first chemical includes carbon and hydrogen; a second chemical that includes carbon, wherein the second chemical further includes hydrogen or fluorine; and a linker that is linked to both the first chemical and the second chemical, wherein the linker includes : a first compound that contains carbon, oxygen, sulfur, and hydrogen; or a second compound that contains sulfur, oxygen, and hydrogen.